STUDY OF THE DIFFUSION COEFFICIENT FOR HYDROGEN-SILICON AND HYDROGEN-GRAPHITE MIXTURES IN DENSE PLASMA

Abstract

Research in the field of hot dense matter and inertial confinement of nuclear fusion is gaining increasing importance in modern science. It also allows for a deeper understanding of the internal dynamics of giant planets, accretion of matter near stars, the influence of radiation pressure, including convection and diffusion processes in their internal structure, and spectral evolution. Metallic hydrogen plays a key role in studying heat transfer and diffusion processes in dense environments. It has significant practical applications, potentially being used as a superconductor in science and technology. This work investigates diffusion processes in dense hydrogen plasma. Using the Debye potential model, diffusion coefficients were calculated for different values of the plasma non-ideality parameter using the Chapman-Enskog method. Special attention was given to the interaction of plasma with materials based on silicon and graphite. The results obtained using the Debye potential show good agreement with molecular dynamics models and AA-TCP (average-atom two-component plasma) models in the regime of weak interactions, where Γ < 1. This confirms the reliability of the method and its applicability for analyzing weakly bound systems.В данной работе изучен процесс диффузии в плотной водородной плазме. Оценены коэффициенты диффузии для смесей водрод-кремний и водород-графит. Результаты, полученные на основе потенциала Дебая, обнаруживают лучшее согласие в пределе слабой связи Γ < 1 по сравнению с методом молекулярной динамики и моделью AA-TCP (average-atom, two-component plasma model).